CPL @1108 (51.7%) on 06-jun-2018 [ "silicon wafer by _" "_ using negative" "modern process of _" "semiconductor substrate by _" "process steps , such as _" "new art of _" "photoresists for _" "printing process called _" "art , specializing in _" "wafer by _" "fabrication techniques , such as _" "exposure systems for _" ] using photolithography
CMC @125 (99.9%) on 20-jun-2010 [ PREFIX=phot 2.09863 PREFIX=pho 1.94890 PREFIX=ph 1.62176 LASTPREFIX=phot 1.52014 LASTPREFIX=pho 1.40507 LASTPREFIX=ph 1.05674 SUFFIX=phy 0.74841 FULL_WORDSHAPE=a -0.74508 FULL_POS=NN -1.62574 WORDS -2.63198 ] using photolithography
SEAL @1 (50.0%) on 12-jan-2010 [ 1 ] using photolithography